China's EUV light source shown publicly at CIIF 2026, hinting supply chain nears breakthrough
pstAsiatech · x · 2026-10-15
Langdao Silex Tech showcased its Flint-LPP EUV light source at CIIF 2026: FlintNano is already in production while FlintMicro is still being validated. The company also exhibited Glow-series MOPA lasers up to 20 kW, deemed sufficient for commercial lithography. The author argues the key signal is not the gap vs ASML's latest machines but that the supply chain is willing to display products publicly — combined with Huawei execs discussing EUV development in China this week, suggesting domestic EUV is nearing a milestone.
Related event: Chinese EUV Light Source Makes Public Debut at Industry Expo(2 posts)→
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