Dresden fab likely targets 7nm without EUV via immersion multi-patterning
pstAsiatech · x · 2026-10-10
The quoted post analyzes the likely technology path for the new Dresden chip fab, arguing it resembles an optical 7nm node without EUV.
Key points:
- Dresden probably cannot install an EUV system like Malta, and the €1B budget suggests otherwise too;
- Newer immersion lithography tools with multi-patterning can readily deliver workable 7nm yields;
- GlobalFoundries was far along at Malta before bailing on 7nm, so this isn't starting from scratch.
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