Zeiss executive: China about 15 years behind on EUV lithography tools
pstAsiatech · x · 2026-09-04
A top executive at Zeiss, a key supplier in the global semiconductor toolchain, says China is roughly 15 years behind in developing EUV lithography tools. The poster is skeptical, suggesting the real gap may be closer to half that figure.
Related event: Zeiss Executive Says China Lags 15 Years in EUV Lithography(3 posts)→
More from Infra
- PostgreSQL 19 slips to November as LLM-assisted code review floods committers with edge cases — sanjaykalra · 2026-10-21
- Decision Models' routing classifier hits AntSeed, cutting inference cost to 24% of always-Opus — airesearch12 · 2026-10-21
- Eon cuts engineer onboarding from 2 days to 2 minutes with an MCP Gateway on Bedrock AgentCore — AWS ML Blog · 2026-10-20
- a16z's Ben Horowitz says AI buildout isn't the 90s bubble — an investor pushes back — henloitsjoyce · 2026-10-20
- Micron and Nvidia drive ~36% of S&P 500's Q3 earnings growth — Beth_Kindig · 2026-10-20
- NVIDIA lands in Europe: Jensen Huang and German chancellor discuss industrial AI at GTC Berlin — nvidia · 2026-10-20