Semis debate: is high-NA EUV (EXE:5200) cost-effective for 18A nodes as TSMC demands tool upgrades
pstAsiatech · x · 2026-10-24
A semiconductor-focused exchange questioning whether high-NA EUV lithography (ASML EXE:5200) is cost-effective for 18A with backside power supply. The poster notes that at 16/14A everyone will use BSP anyway, and that TSMC has indicated at least 3 major tool upgrades are needed before adopting high-NA — one stated, two implied from timing — a substantive debate on advanced-node equipment roadmaps and cost.
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