Photonic IC paper's method details: mask stitching, backside protection, defect control
jwt0625 · x · 2026-10-19
A detailed look at the methods section of a photonic integrated light-engine paper for cold atoms (Isichenko2026, using a Modulight 780nm DBR laser die):
- Particle control: Surfscan 6200 (488nm, 0.160μm threshold) found 204 light-point defects on the 4-inch wafer, 3.35 cm⁻² density, 78% sub-micron
- Backside protection: acetone/IPA spin cleaning plus razor-blade photoresist removal before each lithography step to prevent focus drift
- IQC protocol: separate exposure calibration for waveguide (14.5 mJ·cm⁻²) and partial-etch grating (25 mJ·cm⁻²) steps, keeping focus correction below 20nm
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